[1]
|
57. M. H. Juang, J. Yu, C. C. Hwang, D. C. Shye, J. L. Wang, “Trench MOS barrier Schottky rectifier formed by counter-doping trench bottom implantation”, Microelectronics Reliability, in press, 2010. |
[2]
|
56. M. H. Juang, Y. S. Peng, D. C. Shye, J. L. Wang, C. C. Hwang, and S. L. Jang, “Submicron-meter tunneling field-effect poly-Si thin-film transistors with a thinned channel layer”, Microelectronics Engineering, in press, 2010. |
[3]
|
55. M. H. Juang, Y. S. Peng, J. L. Wang, D. C. Shye, C. C. Hwang, and S. L. Jang, “Submicron-meter polycrystalline-SiGe thin-film transistors with tunneling field-effect-transistor structure”, Solid State Electronics, vol. 54, in press, 2010. |
[4]
|
54. M. H. Juang, Y. S. Peng, J. L. Wang, D. C. Shye, C. C. Hwang, and S. L. Jang, “Microcrystalline-Si thin film transistors formed by using palladium silicided source/drain contact electrode”, Solid State Electronics, vol. 54, in press, 2010. |
[5]
|
53. M. H. Juang, C. N. Lu, S. L. Jang, and H. C. Cheng, “Study of ultra-shallow p+n junctions formed by excimer laser annealing”, Material Chemistry and Physics, vol. 123, pp. 280-263, 2010. |
[6]
|
52. M. H. Juang, C. W. Chang, D. C. Shye, C. C. Hwang, J. L. Wang, and S. L. Jang, “A process simplification scheme for fabricating CMOS polycrystalline-Si thin film transistors”, Journal of Semiconductors, vol. 31, 064003, 2010. |
[7]
|
51. M. H. Juang, C. W. Chang, D. C. Shye, J. L. Wang, C. C. Hwang, and S. L. Jang, “Study of polycrystalline-Si thin film transistors with different channel layer thickness at low bias voltage”, Microelectronics Engineering, vol. 87, pp. 1896-1900, 2010. |
[8]
|
50. S. L. Jang, C. C. Shih, C. C. Liu, and M. H. Juang, “A 0.18 um CMOS Quadrature VCO using the quadruple push-push technique”, IEEE Microwave and Wireless Component Lett., vol. 20, pp. 343-345, 2010. |
[9]
|
49. M. H. Juang, C. C. Hwang, D. C. Shye, J. L. Wang, and S. L. Jang, “Formation of 30-V power DMOSFET’s by implementing p-counter-doped region within n-type drift layer”, Solid State Electronics, vol. 54, pp. 724-727, 2010. |
[10]
|
48. S. L. Jang, C. C. Liu, Y. J. Song, and M. H. Juang, ”A low voltage balanced clapp VCO in 0.13 micromolar CMOS technology”, Microwave and Optical Technology Lett., vol. 52, pp. 1623-1625, 2010. |
[11]
|
47. S. L. Jang, J. J. Chen, C. C. Liu, and M. H. Juang, ” Injection-Locked frequency tripler with series-tuned resonator in 0.13μm CMOS technology”, Microwave and Optical Technology Lett., vol. 52, pp. 1107-1110, 2010. |
[12]
|
46. M. H. Juang, P. S. Hu, and S. L. Jang, “Formation of polycrystalline-Si thin-film transistors with tunneling field-effect-transistor structure”, Thin Solid Films, vol. 518, pp. 3978-3981, 2010. |
[13]
|
45. M. H. Juang, C. W. Chang, J. L. Wang, D. C. Shye, C. C. Hwang, and S. L. Jang, “Formation of n-channel polycrystalline-Si thin film transistors by dual source/drain implantation”, Solid State Electronics, vol. 54, pp. 516-519, 2010. |
[14]
|
44. M. H. Juang, C. W. Chang, D. C. Shye, J. L. Wang, C. C. Hwang, and S. L. Jang, “Formation of sub-micrometer polycrystalline-SiGe thin film transistors by using a thinned channel layer”, Solid State Electronics, vol. 54, pp. 303-306, 2010. |
[15]
|
43. M. H. Juang, C. W. Huang,, M. L. Wu, D. C. Shye, J. L. Wang, C. C. Hwang, and S. L. Jang, “Formation of n-channel polycrystalline-Si thin-film transistors by using retrograde channel scheme with double implantation”, Microelectronics Engineering, vol. 87, pp. 620-623, 2010. |
[16]
|
42. C. C. Liu, S. L. Jang, J. J. Chen, and M. H. Juang, “A 0.6-V low-power Armstrong VCO in 0.18 ?m CMOS”, Microwave and Optical technology Lett., vol. 52, pp. 116-119, 2010. |
[17]
|
41. S. L. Jang, C. W. Lin, C. C. Liu, and M. H. Juang, “Tail-injected divide-by-4 qadrature injection locked frequency divider”, Inter. J. Electronics, vol. 96, pp. 1225-1235, 2009. |
[18]
|
40. S. L. Jang, J. Y. Wun, C. C. Liu, and M. H. Juang, “A low power LC-tank SiGe BiCMOS injection locked frequency divider”, Microwave and Optical technology Lett., vol. 51, pp. 1970-1973, 2009. |
[19]
|
39. S. L. Jang, C. C. Lin, S. H. Huang, and M. H. Juang, “Quadrature cross-coupled VCO implemented with body injection-locked frequency divider”, Microwave and Optical technology Lett., vol. 51, pp. 1918-1921, 2009. |
[20]
|
38. M. H. Juang, C. W. Huang, C. W. Chang, D. C. Shye, J. L. Wang, C. C. Hwang, and S. L. Jang, “The formation of polycrystalline-Si thin-film-transistors by using large-angle- tilt implantation of dopant through gate sidewall spacer ”, Solid State Electronics, vol. 53, pp. 1036-1040, 2009. |
[21]
|
37. S. L. Jang, C. H. Yang, C. C. Liu, and M. H. Juang, “A wide-locking range 6-phase divide-by-3 injection-locked frequency divider”, Inter. J. Electronics, vol. 96, pp. 691-697, 2009. |
[22]
|
36. S. L. Jang, K. C. Shen, C. W. Chang, and M. H. Juang, “A six-phase divide-by-3 injection-locked frequency divider in SiGe BiCMOS technology”, Microwave and Optical technology Lett., vol. 51, pp. 1555-1557, 2009. |
[23]
|
35. S. L. Jang, R. K. Yang, C. W. Chang, and M. H. Juang, “ Multi-modulus LC injection-locked frequency dividers using single-ended injection”, IEEE Microwave and Wireless Component Lett., vol. 19, pp. 311-313, 2009. |
[24]
|
34. S. L. Jang, C. W. Chang, W. C. Cheng, and M. H. Juang, “Low-power divide-by-3 injection-locked frequency dividers implemented with injection transformer”, Electronic Lett., vol. 45, pp. 240-241, 2009. |
[25]
|
33. S. L. Jang, C. C. Liu, C. Y. Wu, and M. H. Juang, “A 5.6 GHz power balanced VCO in 0.18 ?m CMOS”, IEEE Microwave and Wireless Component Lett., vol. 19, pp. 233-235, 2009. |
[26]
|
32. S. L. Jang, S. S. Huang, C. F. Lee, and M. H. Juang, “CMOS Colpitts quadrature VCO using the body injection-locked coupling technique”, IEEE Microwave and Wireless Component Lett., vol. 19, pp. 230-232, 2009. |
[27]
|
31. M. H. Juang, S. H. Cheng, and S. L. Jang, “Formation of polycrystalline-Si thin-film-transistors with a retrograde channel doping profile”, Solid State Electronics, vol. 53, pp.371-375, 2009. |
[28]
|
30. M. H. Juang P. S. Hu, and S. L. Jang, “Formation of lateral SiGe tunneling field-effect transistors on the SiGe/oxide/Si-substrate”, Semi. Sci. Technol., vol. 24, 025019(4pp), 2009. |
[29]
|
29. S. L. Jang, C. W. Lin, C. C. Liu, and M. H. Juang, “An active-inductor injection locked frequency divider with variable division ratio”, IEEE Microwave and Wireless Component Lett., vol. 19, pp. 39-41, 2009. |
[30]
|
28. S. L. Jang, S. S. Huang, C. F. Lee, and M. H. Juang, “ CMOS Quadrature VCO implemented with two first-harmonic injection-locked oscillators”, IEEE Microwave and Wireless Component Lett., vol. 18, pp. 695-697, 2008. |
[31]
|
27. M. H. Juang, I. S. Tsai, and S. L. Jang, “The formation of polycrystalline-Si thin-film transistors with a thinned channel layer”, Semi. Sci. Technol., vol. 23, 105003(4pp), 2008. |
[32]
|
26. S. L. Jang, S. H. Huang, C. F. Lee, and M. H. Juang, “ LC-tank Colpitts injection-locked frequency divider with record locking range”, IEEE Microwave and Wireless Component Lett., vol. 18, pp. 560-562, 2008. |
[33]
|
25. S. L. Jang, S. C. Wu, C. F. Lee, and M. H. Juang, “CMOS top-series coupling quadrature injection-locked frequency divider”, Microwave and Optical technology Lett., vol. 50, pp. 2554-2557, 2008. |
[34]
|
24. S. L. Jang, P. X. Lu, C. F. Lee, and M. H. Juang, “Divide-by-3 LC injection locked frequency divider with a transformer as an injector’s load”, Microwave and Optical technology Lett., vol. 50, pp. 2722-2725, 2008. |
[35]
|
23. M. H. Juang, I. S. Tsai, S. L. Jang, and H. C. Cheng, “Formation of thin-film transistors with a polycrystalline hetero-structure channel layer”, Semi. Sci. Technol., vol. 23, 085017(4pp), 2008. |
[36]
|
22. S. L. Jang, S. S. Huang, S. C. Wu, C. F. Lee, and M. H. Juang, “A low power X-band CMOS differential VCO”, Microwave and Optical technology Lett., vol. 50, pp. 1389-1391, 2008. |
[37]
|
21. S. L. Jang, F. H. Chen, C. F. Lee, and M. H. Juang, “An LC-tank injection locked frequency divider with record locking range percentage”, Microwave and Optical technology Lett., vol. 50, pp. 808-810, 2008. |
[38]
|
20. S. L. Jang, W. H. Yeh, C. F. Lee, and M. H. Juang, “A low power CMOS divide-by-3 LC-tank injection locked frequency divider”, Microwave and Optical technology Lett., vol. 50, pp. 259-263, 2008. |
[39]
|
19. M. H. Juang C. L. Chen, and S. L. Jang, “A study of shallow trench isolation by using a ploy-Si sidewall buffer layer”, Semi. Sci. Technol., vol. 23, 015002(4pp), 2008. |
[40]
|
18. C. F. Lee, S. L. Jang, and M. H. Juang, “ A wide locking range differential Colpitts injection locked frequency divider”, IEEE Microwave and Wireless Component Lett., vol. 17, pp. 790-792, 2007. |
[41]
|
17. S. L. Jang, C. Y. Lin, C. F. Lee, and M. H. Juang, “A complementary Hartley injection-locked frequency dividers”, Microwave and Optical technology Lett., vol. 49, pp. 2817-2820, 2007. |
[42]
|
16. S. H. Lee, S. L. Jang, C. F. Lee, and M. H. Juang, “Wide locking range divide-by-4 injection locked frequency dividers”, Microwave and Optical technology Lett., vol. 49, pp. 1533-1536, 2007. |
[43]
|
15. S. H. Lee, S. L. Jang, Y. H. Chuang, J. J. Chao, J. F. Lee, and M. H. Juang, “A low power injection locked LC-tank oscillator with current reused topology”, IEEE Microwave and Wireless Component Lett., vol. 17, pp. 220-221, 2007. |
[44]
|
14. Y. H. Chuang, S. H. Lee, S. L. Jang, and M. H. Juang, “A low-voltage quadrature CMOS VCO based on voltage-voltage feedback topology”, IEEE Microwave and Wireless Component Lett., vol. 16, pp. 696-698, 2006. |
[45]
|
13. Y. H. Chuang, S. H. Lee, S. L. Jang, J. J. Chao, and M. H. Juang, “A ring-oscillator-based wide locking range frequency divider”, IEEE Microwave and Wireless Component Lett., vol. 16, pp. 470-471, 2006. |
[46]
|
12. Y. H. Chuang, S. H. Lee, R. H. Yen, S. L. Jang, and M. H. Juang, “A wide locking range and low voltage CMOS direct injection-locked frequency divider”, IEEE Microwave and Wireless Component Lett., vol. 16, pp. 299-301, 2006. |
[47]
|
11. M. H. Juang W. C. Chueh, and S. L. Jang, “The formation of trench-gate power MOSFETs with a SiGe channel region”, Semi. Sci. Technol., vol. 21, pp. 709-802, 2006. |
[48]
|
10. M. H. Juang, T. Y. Lin, and S. L. Jang, “The formation of Mo gate electrode with adjustable work function on thin Ta2O5 high-k dielectric films ”, Solid State Electronics, vol. 50, pp. 114-118, 2006. |
[49]
|
9. M. H. Juang and Y. M. Chiu, “Effects of a lightly-doped-drain (LDD) implantation condition on the device characteristics of poly-Si thin-film-transistors”, Semi. Sci. Technol., vol. 21, pp. 291-294, 2006. |
[50]
|
8. M. H. Juang and Y. M. Chiu, “High-performance poly-Si thin-film-transistors formed by using large-angle-tilt implanted drain”, Semi. Sci. Technol., vol. 20, pp. 1223-1225, 2005. |
[51]
|
7. Heng-Fa Teng, S.-L. Jang , and M. H. Juang, " Modeling of Degradation Effects on the High Frequency Noise of Metal-Oxide-Semiconductor Field-Effect Transistors”, Japan Journal Applied Physics, vol. 44, pp. 38-43, 2005. |
[52]
|
6. M. H. Juang, W. T. Chen, C. I. Ou-Yang, and S. L. Jang, M. J. Lin, and H. C. Cheng, “Fabrication of trench-gate power MOSFETs by using a dual doped body region”, Solid State Electronics, vol. 48, pp. 1079-1085, 2004. |
[53]
|
5. H. F. Teng, S. L. Jang, and M. H. Juang, “A unified model for high-frequency current noise of MOSFETs”, Solid State Electronics, vol. 47, pp. 2043-2048, 2003. |
[54]
|
4. D. C. Shye, C. C. Hwang, M. J. Lai, C. C. Jaing, J. S. Chen, S. Huang, M. H. Juang, B. S. Chiou, and H. C. Cheng, “Effects of post-oxygen treatment on Pt/(Ba,Sr)TiO3/Pt capacitors at low substrate temperatures”, Jpn. J. Appl. Phys., vol. 42, pp. 549-553, 2003. |
[55]
|
3. M. H. Juang, C. I. Ou-Yang, and S. L. Jang, “A design consideration of channel doping profile for sub-0.12 mm partially depleted SOI n-MOSFET’s”, Solid State Electronics, vol. 46, pp. 1117-1121, 2002. |
[56]
|
2. M. H. Juang, L. C. Sun, W. T. Chen, and C. I. Ou-Yang, “A process simplification scheme for fabricating self-aligned silicided trench-gate power MOSFET’s”, Solid State Electronics, vol. 45, pp. 169-172, 2001. |
[57]
|
1. C. C. Hwang, M. H. Juang, M. J. Lai, C. C. Jaing, J. S. Chen, S. Huang, and H. C Cheng, “Effect of rapid-thermal-annealed TiN barrier layer on the Pt/BST/Pt capacitors prepared by RF magnetron cosputter technique at low substrate temperatures”, Solid State Electronics, vol. 45, pp. 121-125, 2001. |