教師資料

趙良君 Liang -Chiun Chao
職稱
教授
學歷
美國馬里蘭大學博士
電子郵件
lcchao@mail.ntust.edu.tw
辦公室
EE813-3

Office Hours Tu.10:30 ~ 12:20
電話 886-2-27376369
傳真 886-2-27376424
個人網頁 http://noel.et.ntust.edu.tw
實驗室 奈米光電實驗室
研究領域 低維度半導體奈米結構、離子束技術及應用、光電元件
開授課程 物理、固態電子(一)(二)

2004.08 ~  迄今 臺灣科技大學電子工程系
2002.01 ~  2004.07 Pixelligent 科技公司
2001.07 ~  2002.11 美國應用材料公司
1998.01 ~  2001.06 美國辛辛那提大學博士後研究



研究成果
  [1]   L. C. Chao, Y. K. Li and W. C. Chang “Growth of ZnO quantum dots on Si nano ripples,” Materials Lett., vol. 2011, pp. 1615-1617, 2011.
  [2]   L. C. Chao, C. F. Lin and C. C. Liau “Effect of surface morphology of metallic zinc films deposited by ion beam sputter deposition on the formation of ZnO nanowires,” Vacuum, 2011, in press.
  [3]   L. C. Chao, S. J. Lin and W. C. Chang “Growth, characterization and effect of substrate bias on ZnO prepared by reactive capillaritron ion beam sputtering deposition,” Nucl. Instr. and Meth. B, vol. 268, pp. 1581-1584, 2010.
  [4]   L. C. Chao, Y. R. Shih, Y. K. Li, J. W. Chen, J. D. Wu and C. H. Ho, “Nitrogen-doped ZnO prepared by capillaritron reactive ion beam sputtering deposition,” Appl. Surf. Sci., vol. 256, pp. 4153-4156, 2010.
  [5]   A. Yu. Antonov, N. V. Egorov and L. C. Chao, “Determination of the coefficient of electron transmission using temperature measurements,” Journal of Surface Investigation: X-ray, Synchrotron and neutron Techniques, vol. 3, pp. 826-832, 2009
  [6]   N. V. Egorov, L. I. Antonova, S. R. Antonov, D. V. Zhukov and L. C. Chao, “Efficient electron sources utilizing the effect of field emission, ” Technical Physics, vol. 54, pp. 916-918, 2009.
  [7]   L. C. Chao, D. Y. Tsai and Y. R. Shih, “ZnO thin films deposited by capillaritron ion beam sputtering deposition,” Nucl. Instr. and Meth. B, in press, 2009.
  [8]   L. C. Chao, J. W. Huang, and C. W. Chang, “Annealing effects on the properties of Nd containing ZnO nanoparticles,” Physica B, vol. 404, pp. 1301-1304, 2009.
  [9]   L. C. Chao, C. W. Chang and D. Y. Tsai, “Erbium containing ZnO prepared by ion beam sputtering deposition and thermal annealing mixing,” Appl. Surf. Sci., vol. 255, pp. 6525-6528, 2009.
  [10]   L. C. Chao, H. T. Hu, S. H. Yang, and Y. C. Fan, “Effect of annealing on the properties of (100) ZnO films prepared by chemical vapor deposition utilizing zinc acetate dihydrate,” Thin Solid Films, vol. 516, pp. 6305-6309, 2008.
  [11]   L. C. Chao, J. W. Lee, and C. C. Liau, “ZnO nanoneedles prepared by ion implantation and thermal oxidation on metallic zinc foils,” J. Phys. D: Appl. Phys., vol. 41, p. 115405, 2008.
  [12]   L. C. Chao, F. C. Tsai, and J. C. Su, “Improvement of photon extraction efficiency of InGaN LEDs utilizing textured ZnO layer deposited by electrospray deposition,” Materials Science in Semiconductor Processing, vol. 11, pp. 13-15, 2008.
  [13]   L. C. Chao, M. Y. Hsieh, and S. H. Yang, “Effect of carrier gas species and flow rates on the properties of ZnO thin films prepared by chemical vapor deposition using zinc acetate dihydrate,” Appl. Surf. Sci., vol. 254, pp. 7464-7468, 2008.
  [14]   L. C. Chao, C. C. Liau, S. J. Lin, and J. W. Lee, “ZnO nanostructures grown on zinc nanocones by thermal oxidation,” J. Vac. Sci. Tech. B, vol. 26, pp. 2601-2603, 2008.
  [15]   L. C. Chao and S. H. Yang, “Growth and Auger electron spectroscopy characterization of donut-shaped ZnO nanostructures,” Appl. Surf. Sci., vol. 253, pp. 7162-7165, 2007.
  [16]   L. C. Chao, C. C. Liau, J. W. Lee, and F. C. Tsai, “Fabrication of zinc nanotip arrays by ion beam sputtering,” J. Vac. Sci. Tech. B, vol. 25, pp. 2168-2170, 2007.
  [17]   L. C. Chao, P. C. Chiang, S. H. Yang, J. W. Huang, C. C. Liau, J. S. Chen, and C. Y. Su, “Erbium doped zinc oxide prepared by vapor phase transport,” Jap. J. Appl. Phys., vol. 45, pp. L938-L940, 2006.
  [18]   L. C. Chao, P. C. Chiang, S. H. Yang, J. W. Huang, C. C. Liau, J. S. Chen, and C. Y. Su, “Zinc oxide nanodonut prepared by vapor-phase transport process,” Appl. Phys. Lett., vol. 88, p. 25111, 2006.
  [19]   B. K. Lee, R. C.-J. Chi, D. L. -C. Chao, J. Cheng, I. Y. -N. Chyr, F. R. Beyette Jr., and A. J. Steckl, “High density Er-implanted GaN optical memory devices,” Appl. Optics, vol. 40, pp. 3552-3558, 2001.
  [20]   L. C. Chao and A. J. Steckl, “CW blue-green light emission from GaN and SiC by sum-frequency generation and second harmonic generation,” J. Electronic Materials, vol. 29, pp. 1059-1061, 2000.
  [1]   Wei-Jui Chen, Jun-Wei Chen, Chi-Neng Lin, Chung-Chi Liau, Syuan-Miao Lai and Liang-Chiun Chao*, “Formation of Nano-scale Ripples on Si by Ion Beam Sputtering,” ICMAT 2011, Singapore, 2011/06/26~2011/07/01.
  [2]   Sung-Yu Tsai, Ci-Neng Lin, Chung-Chi Liau and Liang-Chiun Chao*, “ZnO nanowires prepared by thermal oxidation of metallic zinc films,” ICMAT 2011, Singapore, 2011/06/26~2011/07/01.
  [3]   L. C. Chao*, C. F. Lin and C. C. Liau, “ZnO nanowires prepared by thermal oxidation of metallic zinc films,” INEC 2010
  [4]   C. C. Liau, W. C. Chang and L. C. Chao*, “Growth and characterization of Er doped ZnO prepared by reactive ion beam sputtering,” INEC 2010
  [5]   T. Y. Chang and L. C. Chao, “MgZnO thin film prepared by reactive ion beam sputter deposition,” 2010中華民國物理年會
  [6]   Y. K. Li, S. Y. Tsai and L. C. Chao, “Quasi-periodic nanostructure of ion-beam-erosion silicon surface,”2010中華民國物理年會
  [7]   W. C. Chang, C. W. Cheng and L. C. Chao, “Field emission properties of pyramidal Al-doped ZnO nanostructure,”2010中華民國物理年會
  [8]   S. J. Lin, W. C. Chang and L. C. Chao*, “Growth and Characterization of ZnO Thin Films Prepared by Reactive Ion Beam Sputtering Deposition with External Electric field,” ICMAT 2009
  [9]   C. C. Liau and L. C. Chao, “Growth and Characterization Of ZnO Quantum Dots by Chemical Vapor Deposition Utilizing Zinc Acetate,” ICMAT, 2009
  [10]   Y. R. Shih, Y. K. Li, and L. C. Chao*, “Nitrogen doped ZnO prepared by capillaritron ion beam sputtering deposition,” ICMAT 2009
  [11]   Y. R. Shih, and L. C. Chao, “Nitrogen doped ZnO prepared by ion beam sputter deposition”, 2009 中華民國物理年會
  [12]   S. J. Lin and L. C. Chao, “Growth and characterization of ZnO thin film prepared by ion beam sputtering deposition,” 2009 中華民國物理年會
  [13]   C. C. Liau and L. C. Chao, “Manufacturing ZnO nanostructures by ion beam technique,” 2009 中華民國物理年會
  [14]   張婉君、趙良君 “反應式離子束濺鍍沈積法沈積氧化鋅薄膜之特性分析” 2009中華民國力學年會
  [15]   李曜愷、趙良君 “離子束濺鍍法成長含氮氧化鋅” 2009中華民國力學年會
  [16]   C. C. Liau, L. C. Chao “The effect of porosity of metal zinc films on the formation of ZnO prepared by thermal oxidation” 2007 中華民國光電年會.
  [17]   C. W. Chang, L. C. Chao “Low temperature synthesis of stick-shaped ZnO via sol-gel method” 2007 中華民國光電年會.
  [18]   J. W. Lee, C. C. Liau, L. C. Chao “Properties of metal zinc nanotip arrays” 2007 中華民國光電年會
  [19]   L. C. Chao, C. C. Cliau, “The effect of porosity of metal zinc films on the formation of ZnO prepared by thermal oxidation”, Mater. Res. Soc. Symp. Proc. 1012-Y03-17 (2007).
  [20]   L. C. Chao, J. S. Chen, and C. C. Liau “An electrostatic objective lens for mini-column ion implantation” 2006 中華民國物理年會
  [21]   S. H. Yang, J. W. Huang, P. C. Chaing, and L. C. Chao “Micro Raman spectroscopy study of zinc oxide nanostructures” 2006 中華民國物理年會
  [22]   S. H. Yang, F. C. Tsai, and L. C. Chao “Growth and characterization of ZnO nanodonut” 2006 中華民國光電年會OPT 2006
  [23]   C. C. Liau, and L. C. Chao “Focused ion beam optical column design using FEMLAB” 2005中華民國光電年會OPT 2005
  [24]   P. C. Chaing, S. H. Yang, and L. C. Chao “Growth and characterization of ZnO nanocolumns” 2005 中華民國光電年會OPT 2005.
  [25]   L. C. Chao “Zonal spherical aberration correction utilizing axial electrode” Proc. SPIE 5592 (2005) 413-420
  [26]   J. Varner, C. Stebler, Y. Hsu, D. Chao, V. Boegli, S. Stovall, D. Trost, and M. Gesley “Microcolumn Lithography” High Throughput Charged Particle Conference, SPIE, Ausust 2001
  [1]   中華民國專利 I333934 “一種對稱奈米結構及其製備方法” 趙良君,蔣秉昌,December 2010。

計畫名稱 計畫總額 執行始於 執行結束 委託單位
低維度氧化鋅奈米結構成長分析及應用探討 3,124,000 9808 10107 國科會
化學氣相沈積氧化鋅研究及離子束製成奈米結構 970000 9708 9807 國科會
層狀奈米結構場發射特性研究 445,672 9701 9712 臺灣科技大學
含鉺氧化鋅奈米結構生長及量測 1,057,000 9608 9707 國科會
含稀土元素氧化鋅奈米結構生長及量測 973,000 9408 9512 國科會
含稀土元素氧化鋅之成長及量測分析 961,400 9312 9407 國科會

指導學生
學年 論文題目 學生
96 以反應式離子束濺鍍法製備掺鉺氧化鋅薄膜之特性分析與研究 廖重期
學年 論文題目 學生
100 鋅-氧化鋅核殼結構奈米線光檢測特性 陳謚霈
100 陽極層離子源反應式濺鍍沉積摻氮氧化鋅薄膜之特性 彭翰晨
100 氧化鋅奈米線的光致發光及紫外光檢測特性 葉詞超
100 離子束濺鍍法沉積氧化銦錫透明導電膜之特性分析 鄭立琦
100 基板材質對氧化鋅奈米粒子成長之影響 賴宣妙
99 以熱氧化法製備摻鈷氧化鋅奈米線之特性分析 林啟能
99 以反應式雙離子共濺鍍法沉積氧化鋅鎂薄膜及其特性分析 張慈讌
99 以離子束蝕刻矽晶圓形成奈米波紋結構 陳威叡
99 以反應式離子束濺鍍法沉積含氮p型氧化鋅薄膜 陳鈞瑋
99 以熱氧化金屬鋅薄膜法成長一維氧化鋅奈米結構之特性分析 蔡松諭
98 以反應式離子束濺鍍法沉積摻雜鋁氧化鋅薄膜之特性分析 張婉君
97 反應式離子束濺鍍沉積氧化鋅薄膜 蔡富傑
97 退火條件對以離子束濺鍍法沈積氧化鋅薄膜之特性研究 蔡東逸
97 以離子束濺鍍法製備摻鉺氧化鋅薄膜特性分析 張仲文
97 以離子佈植及熱氧化製成氧化鋅奈米結構 李俊緯
97 化學氣相沉積氧化鋅薄膜特性分析 謝孟耘
97 使用反應式離子束濺鍍法沉積製備掺氮氧化鋅薄膜 石喻任
97 以反應式離子束濺鍍沉積法成長之氧化鋅薄膜的特性分析 林軒至
97 以反應式離子束濺鍍法成長氧化鋅鎂薄膜 胡晧霆
96 化學氣相沉積氧化鋅薄膜之成長與特性分析 楊識軒
96 以溶膠凝膠法製備摻釹氧化鋅之特性分析 黃健瑋
96 載氣種類流量及溫度對化學氣相沉積氧化鋅薄膜特性影響 謝孟耘
95 掺鉺氧化鋅之成長與特性分析 蔣秉昌
學年 專題題目 學生
97 以離子束濺鍍法沈積含氮氧化鋅薄膜 游源晉、吳彥霈、王茂樺
97 氧化鋅量子點成長及分析 朱峻緯, 沈文乾, 絲一翔
96 以離子束濺鍍法沈積含鉺氧化鋁 蔡偉聖 , 黃子榮
95 Growth and Characterization of Nd:ZnO by SS-CVD B056林育新 B040洪敏竣
94 含鉺氧化鋅薄膜及奈米結構 胡皓霆/范揚君
年份 事蹟